Wave-front correction methods for extreme-ultraviolet multilayer reflectors

Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors.

We report on the development of a hybrid mirror realized by integrating an EUV-reflecting multilayer coating with a lamellar grating substrate. This hybrid mirror acts as an efficient Bragg reflector for extreme ultraviolet (EUV) radiation at a given wavelength while simultaneously providing spectral-selective suppression of the specular reflectance for unwanted longer-wavelength radiation due ...

Probing multilayer stack reflectors by low coherence interferometry in extreme ultraviolet.

We use low coherence interferometry to investigate the depth structure of a complex multilayer stack reflector. The probing instrument is an interferometer based on a Fresnel's bi-mirror illuminated by relatively wide-band synchrotron undulator light near 13.5 nm. Simulations clearly confirm that our test object generates two back propagated signals that behave as if reflected on two effective ...

Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity.

We show numerically that the reflectivity of multilayer extreme-UV (EUV) mirrors tuned for the 11-14-nm spectral region, for which the two-component, Mo/Be and Mo/Si multilayer systems with constant layer thickness are commonly used, can be enhanced significantly when we incorporate additional materials within the stack. The reflectivity performance of the quarter-wavelength multilayers can be ...

Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy.

The phase-shifting point-diffraction interferometer (PS/PDI) was recently developed and implemented at Lawrence Berkeley National Laboratory to characterize extreme-ultraviolet (EUV) projection optical systems for lithography. Here we quantitatively characterize the accuracy and precision of the PS/PDI. Experimental measurements are compared with theoretical results. Two major classes of errors...

Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet